具有驻留时间约束和晶圆清洁操作的半导体制造系统调度与优化研究

    Scheduling and Optimization Study of Semiconductor Manufacturing Systems with Residency Time Constraints and Wafer Cleaning

    • 摘要: 为了确保晶圆质量满足市场需求,晶圆厂商必须对具有晶圆清洁操作的槽式晶圆制造系统中的驻留时间进行严格限制,这种处理方式在半导体制造领域较普遍。然而,在槽式晶圆制造系统加工多品种晶圆时,晶圆驻留时间的限制与晶圆清洁操作的安排使得调度问题更复杂。为了解决该问题,针对多品种晶圆同时在系统加工的情况,本文首先分析了晶圆驻留时间约束与加工室清洁操作对系统调度的影响。然后,基于简单易行的拉式策略开发了一种新的调度方法,其关键在于确定机械手在每一步骤上的等待时间。基于这一思想,推导出了晶圆加工需满足的可行性条件,并开发了相应的调度算法实现周期调度。最后,通过实例验证了本文方法的可行性和有效性。

       

      Abstract: To ensure that the quality of wafers meets market demands, wafer manufacturers must strictly limit the residence time in slot-based wafer manufacturing systems with wafer cleaning operations, a common process in the semiconductor manufacturing field. However, when processing multiple types of wafers in slot-based wafer manufacturing systems, the constraints of wafer residence time and the scheduling of wafer cleaning operations make the scheduling problem more complex. To address this challenge, we first analyze the impact of residence time constraints and processing chamber cleaning operations on system scheduling when processing multiple types of wafers simultaneously. Based on a straightforward pull-based strategy, we developed a new scheduling method, with the key focus on determining the waiting time for the robot at each step. Based on this approach, we derived the feasibility conditions for wafer processing and developed a corresponding scheduling algorithm to implement cyclic scheduling. Finally, we provide examples to illustrate the feasibility and effectiveness of the developed method.

       

    /

    返回文章
    返回